STUDIES ON THERMIONIC CATHODE ANODIC VACUUM ARCS

被引:45
作者
MUSA, G [1 ]
MAUSBACH, M [1 ]
机构
[1] UNIV ESSEN GESAMTHSCH,INST LASER & PLASMAPHYS,D-45117 ESSEN,GERMANY
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1994年 / 12卷 / 05期
关键词
D O I
10.1116/1.578961
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Vacuum arc discharges with evaporating anodes employing directly as well as indirectly heated thermionic cathodes are investigated. The observed volt-ampere characteristics of these discharges depend strongly on the temperature of the thermionic cathode, the evaporated anode material, and the relative position of the electrodes. A simple model describing the observed discharge characteristics is proposed. With respect to a possible coating application, the plasma of this arc discharge is investigated at a distance of 250 mm from the evaporating anode. For arc currents between 2 and 4 A and Cu as evaporating anode material, the deposition rate is between 3.5 and 5.1 nm/s, the degree of ionization ranges from 0.6% to 6.2%, and electron temperatures are between 5.8 and 15 eV. The observed directed energy of the ions exceeds 100 eV. An examination of the deposited Cu films reveals as main results: Purity>99.5%, compact structure, and smoothening of the film surfaces with increasing degree of ionization.
引用
收藏
页码:2887 / 2895
页数:9
相关论文
共 25 条
[1]  
Dorodnov A. M., 1981, Soviet Physics - Technical Physics, V26, P304
[2]  
Dorodnov A. M., 1979, Soviet Technical Physics Letters, V5, P418
[3]  
EHRICH H, 1988, VAKUUM-TECH, V37, P176
[4]   PLASMA DEPOSITION OF THIN-FILMS UTILIZING THE ANODIC VACUUM-ARC [J].
EHRICH, H ;
HASSE, B ;
MAUSBACH, M ;
MULLER, KG .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1990, 18 (06) :895-903
[5]   THE ANODIC VACUUM-ARC AND ITS APPLICATION TO COATING [J].
EHRICH, H ;
HASSE, B ;
MAUSBACH, M ;
MULLER, KG .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03) :2160-2164
[6]   THE ANODIC VACUUM-ARC .2. EXPERIMENTAL-STUDY OF ARC PLASMA [J].
EHRICH, H ;
HASSE, B ;
MULLER, KG ;
SCHMIDT, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (04) :2499-2503
[7]   THE ANODIC VACUUM-ARC .1. BASIC CONSTRUCTION AND PHENOMENOLOGY [J].
EHRICH, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (01) :134-138
[8]  
HAMILTON HJ, 1967, Patent No. 1496697
[9]  
Kljuchkov G. V., 1985, Patent US, Patent No. 4492845
[10]  
LAFFERTY JM, 1980, VACUUM ARCS THEORY A