X-RAY FOCUSING WITH ELLIPTIC KIRKPATRICK-BAEZ MIRROR SYSTEM

被引:15
作者
SUZUKI, Y [1 ]
UCHIDA, F [1 ]
机构
[1] HITACHI LTD, CENT RES LAB, KOKUBUNJI, TOKYO 185, JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1991年 / 30卷 / 05期
关键词
X-RAY MICROPROBE; SYNCHROTRON RADIATION; X-RAY MIRROR; X-RAY MICROSCOPY; KIRKPATRICK-BAEZ MICROSCOPE;
D O I
10.1143/JJAP.30.1127
中图分类号
O59 [应用物理学];
学科分类号
摘要
Focusing Properties of a grazing-incidence mirror system are tested using a monochromatized synchrotron radiation X-ray source. The optical system employs two mirrors, each of elliptical cylinder shape, arranged in a crossed-mirror geometry (Kirkpatrick-Baez configuration) and generates a demagnified image of a 100-mu-m-diameter pinhole placed upstream in the beamline as the X-ray source. Edge-scan profiles show the focused spot size at half-maximum of about 1.7-mu-m x 3.8-mu-m at a wavelength of 2.3 angstrom. In two-dimensional scanning of test patterns, a fine pattern of a 0.6-mu-m line and 0.6-mu-m space was resolved.
引用
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页码:1127 / 1130
页数:4
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