ELECTRODEPOSITION OF COBALT-CHROMIUM ALLOY FROM TRIVALENT CHROMIUM SOLUTIONS

被引：13

作者：

DASARATHY, H

RILEY, C

COBLE, HD

机构：

[1] Department of Chemistry and Materials Science, University of Alabama, Huntsville

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1994年 / 141卷 / 07期

关键词：

D O I：

10.1149/1.2055003

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Cobalt-chromium alloy was deposited from plating solutions containing cobalt(II) chloride and chromium(III) chloride at 3.5 pH. The deposits were obtained using both single and mixed complex solutions. Deposit morphology showed significant dependence on the complexing agent(s), used. Partitioning of the two components in the deposit as determined by energy dispersive spectroscopy depended on plating parameters such as concentration ratio of the two salts in the solution, complexing agent, type of current (both dc and pulsed current were studied), and current density. X-ray photoelectron spectroscopy spectra collected from as-deposited alloy revealed the presence of both oxides and metals. X-ray diffraction spectra for the alloy deposit indicated solid solution formation.

引用

页码：1773 / 1779

页数：7

共 11 条

[1]

BRENNER A, 1963, ELECTRODEPOSITION AL, V1, P49

[2]

ELSEA AR, 1949, T AIME, V180, P569

[3] PULSE PLATING OF CHROMIUM-COBALT ALLOYS CONTAINING A PHASE WITH THE A-15 STRUCTURE [J].