RELATIONSHIP BETWEEN CORRECTION FACTOR OF 4-POINT PROBE VALUE AND SELECTION OF POTENTIAL AND CURRENT ELECTRODES

被引:46
作者
RYMASZEWSKI, R
机构
[1] Katedra Miernictwa Elektronicznego, Politechnika Wroclawska, Wroclaw
来源
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS | 1969年 / 2卷 / 02期
关键词
D O I
10.1088/0022-3735/2/2/312
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The results of the theoretical analysis of the relationships between the four-point probe factors are presented. For any configuration of the four electrodes on the thin film specimen there are at the most three different correction factors, in respect to the absolute value, if the potential and current electrodes are arbitrarily chosen. There are certain groups of electrode configurations for which the three factors are related by exponential relationships. If the electrodes are placed along the thin film boundary, one of the equations gives Van der Pauw's equation. Two practical applications of the theoretical results are shown, namely an experimental method of calibrating some four-point arrays, and the four-point method utilizing the balanced distribution of the four deposited electrodes, in order to increase the precision of the sheet resistivity measurement.
引用
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页码:170 / +
页数:1
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