INFLUENCE OF TEMPERATURE ON THE GROWTH OF TIN FILMS BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION

被引：30

作者：

SANDERS, FHM

VERSPUI, G

机构：

[1] Cent for Manufacturing Technology, Eindhoven, Neth, Cent for Manufacturing Technology, Eindhoven, Neth

来源：

THIN SOLID FILMS | 1988年 / 161卷

关键词：

This work was supported by the European Community in a BRITE project P-1053-1-85; under contract number RI 1B-107-NL (GDF);

D O I：

10.1016/0040-6090(88)90274-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：L87 / L90

页数：4

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[10]

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