SPUTTERING IN VACUUM ARCS

被引：31

作者：

MILLER, HC

机构：

[1] General Electric Company, Neutron Devices Department, St. Petersburg FL 33733

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1979年 / 12卷 / 08期

关键词：

D O I：

10.1088/0022-3727/12/8/008

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The effective condensation coefficient for the ion flux coming from the cathode spot region of a vacuum arc will be influenced by sputtering. Calculations for a copper vacuum arc indicate that sputtering alone will limit the effective ion condensation coefficient to, at most, 0.94 or 0.80 for copper surfaces at anode or cathode potential, respectively.

引用

收藏

页码：1293 / 1298

页数：6

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