EFFECTS OF OXYGEN IN CAS-EU ACTIVE LAYERS ON EMISSION PROPERTIES OF THIN-FILM ELECTROLUMINESCENT CELLS

被引：13

作者：

ABE, Y

ONISAWA, K

ONO, YA

HANAZONO, M

机构：

[1] Hitachi Research Laboratory, Hitachi Ltd, Hitachi-shi Ibaraki-ken, 319-12

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1990年 / 29卷 / 08期

关键词：

Calcium sulfide; Electroluminescence; Electron beam evaporation; Europium; Oxygen; Thin film;

D O I：

10.1143/JJAP.29.1495

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

CaS:Eu active layers for thin film electroluminescent (TFEL) cells were deposited by the electron beam evaporation method under several partial pressures of oxygen, and the effects of oxygen in CaS:Eu active layers on EL characteristics were studied. With increased deposition pressure, the amount of oxygen in the CaS:Eu thin films increased. The EL efficiency and PL intensity due to Eu2+ ions decreased, and absorption intensity due to Eu2+ ions decreased. In addition, Eu3+ emission peaks were observed in the EL spectrum of the cell prepared at a higher deposition pressure (3×10-2 Pa). From these results, it was concluded that oxidation of Eu ions (Eu2+→Eu3+) occurred and the concentration of Eu2+ ions decreased by adding oxygen during active layer deposition. © 1990 The Japan Society of Applied Physics.

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页码：1495 / 1498

页数：4

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