HOW DOES THE POTENTIAL GET FROM A TO B IN A PLASMA

被引:39
作者
HERSHKOWITZ, N
机构
[1] University of Wisconsin, Department of Nuclear Engineering and Engineering Physics, Madison, WI
关键词
D O I
10.1109/27.281545
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Solutions to the question of how the plasma potential varies from point A to point B, at which the values are specified, are discussed. Each answer depends on plasma and boundary conditions. Plasma potential structures measured by emissive probes are considered. Examples include potentials associated with sheaths and presheaths in collisionless and collisional systems, unmagnetized and magnetized double layers with single and multiple step transitions, semiconductor etching and rf self bias, tandem mirror plasma confinement and tokamak antenna impurity production. DC structures, time average structures associated with capacitive and inductive rf and the role of potential well pumping are considered.
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页码:11 / 21
页数:11
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