DECOMPOSITION AND PRODUCT FORMATION IN CF4-O2 PLASMA-ETCHING SILICON IN THE AFTERGLOW

被引:41
作者
BEENAKKER, CIM
VANDOMMELEN, JHJ
VANDEPOLL, RPJ
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D O I
10.1063/1.329812
中图分类号
O59 [应用物理学];
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页码:480 / 485
页数:6
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