FAR-INFRARED INVESTIGATION OF HIGH INDEX SURFACES ON SILICON

被引：5

作者：

OKAMOTO, H ^{[1
]}

MURO, K ^{[1
]}

NARITA, S ^{[1
]}

KAWAJI, S ^{[1
]}

机构：

[1] GAKUSHUIN UNIV,DEPT PHYS,TOKYO 171,JAPAN

来源：

SURFACE SCIENCE | 1980年 / 98卷 / 1-3期

关键词：

D O I：

10.1016/0039-6028(80)90531-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：505 / 512

页数：8

相关论文

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