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DEPTH PROFILING OF ELEMENTS IN SURFACE-LAYERS OF SOLIDS BASED ON ANGULAR RESOLVED X-RAY PHOTOELECTRON-SPECTROSCOPY

被引：43
作者：
BASCHENKO, OA
NEFEDOV, VI
机构：
[1] N.S. Kurnakov Institute of General and Inorganic Chemistry, the Academy of Sciences, the U.S.S.R., Moscow
来源：
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1990年 / 53卷 / 1-2期
关键词：
D O I：
10.1016/0368-2048(90)80337-A
中图分类号：
O433 [光谱学];
学科分类号：
0703 ; 070302 ;
摘要：
A numerical method is proposed for the non-destructive restoration of the depth-concentration profiles for four components, based on the angular distribution of XPS intensities. Calculations performed for a number of model systems demonstrated that ratios of concentrations obtained by using simplified procedures, i.e. from relative XPS intensities for a single escaping angle, led to large errors (up to 200%) for the upper surface layer. A number of restored profiles are presented using experimental angle-resolved XPS data for samples containing 3-4 components. © 1990.
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页码：1 / 18
页数：18
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