APPROACH TO THE MEASUREMENT OF SHORT WAVELENGTH ABSORPTION PROPERTIES OF PHOTORESISTS

被引：2

作者：

BOHN, PW

TAYLOR, JW

GUCKEL, H

机构：

[1] UNIV WISCONSIN,DEPT CHEM,MADISON,WI 53706

[2] UNIV WISCONSIN,DEPT ELECT & COMP ENGN,MADISON,WI 53706

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 03期

关键词：

D O I：

10.1116/1.570551

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：735 / 738

页数：4

共 9 条

[1]

ERSHOV OA, 1967, FIZ TVERD TELA+, V8, P1699

[2] REPLICATION OF 0.1-MUM GEOMETRIES WITH X-RAY LITHOGRAPHY [J].

FEDER, R ;

SPILLER, E ;

TOPALIAN, J .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1332-1335

[3] PHOTOABSORPTION NEAR LII,III EDGE OF SILICON AND ALUMINUM [J].

GAHWILLER, C ;

BROWN, FC .

PHYSICAL REVIEW B-SOLID STATE, 1970, 2 (06) :1918-+

[4] ABSORPTION MEASUREMENTS OF COPPER SILVER TIN GOLD AND BISMUTH IN FAR ULTRAVIOLET [J].

HAENSEL, R ;

KUNZ, C ;

SASAKI, T ;

SONNTAG, B .

APPLIED OPTICS, 1968, 7 (02) :301-&

[5]

HAGEMANN HJ, 1975, J OPT SOC AM, V65, P742, DOI 10.1364/JOSA.65.000742

[6]

Onari S., 1969, Journal of the Physical Society of Japan, V26, P500, DOI 10.1143/JPSJ.26.500

[7] X-RAY LITHOGRAPHY - COMPLEMENTARY TECHNIQUE TO ELECTRON-BEAM LITHOGRAPHY [J].

SMITH, HI ;

SPEARS, DL ;

BERNACKI, SE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06) :913-917

[8]

SPILLER E, 1976, SOLID STATE TECH APR, P62

[9]

TAYLOR JW, 1974, CHEM SPECTROSCOPY PH

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