ETCHING OF SCREW DISLOCATIONS IN YBA2CU3O7 FILMS WITH A SCANNING TUNNELING MICROSCOPE

被引：40

作者：

HEYVAERT, I

OSQUIGUIL, E

VANHAESENDONCK, C

BRUYNSERAEDE, Y

机构：

[1] Laboratorium voor Vaste-Stof Fysika en Magnetisme, Katholieke Universiteit Leuven, B-3001 Leuven

来源：

APPLIED PHYSICS LETTERS | 1992年 / 61卷 / 01期

关键词：

D O I：

10.1063/1.107656

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report on the systematic unrolling of screw dislocations with the scanning tunneling microscope at the surfaces of sputtered, c-axis oriented YBa2Cu3O7 films. The etching is dominated by field induced evaporation and not by mechanical milling of the surface. The process also enables the controlled drawing of nanometer scale grooves on the film surface.

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页码：111 / 113

页数：3

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