EXPERIMENTAL AND MOLECULAR-DYNAMICS STUDY OF THE AR EMISSION MECHANISM DURING LOW-ENERGY AR + BOMBARDMENT OF CU

被引：18

作者：

FEIL, H ^{[1
]}

VANZWOL, J ^{[1
]}

DEZWART, ST ^{[1
]}

DIELEMAN, J ^{[1
]}

GARRISON, BJ ^{[1
]}

机构：

[1] PENN STATE UNIV,DEPT CHEM,UNIVERSITY PK,PA 16802

来源：

PHYSICAL REVIEW B | 1991年 / 43卷 / 16期

关键词：

D O I：

10.1103/PhysRevB.43.13695

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Angle-resolved time-of-flight distributions of Ar atoms emitted during Ar+ bombardment of Cu have been measured and compared to results of molecular-dynamics simulations. For keV incident energies, implanted Ar atoms escape peaked along the surface normal, due to a high excitation density of the surface, induced by a nearby Ar+ impact and the negligible attraction between Ar and Cu. At low incident energies, the simulations show that the Ar is trapped for a short time in the first Cu layers, undergoes a few collisions and is emitted in a similar direction but at higher kinetic energy.

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页码：13695 / 13698

页数：4

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