SEQUENTIAL SURFACE CHEMICAL-REACTION LIMITED GROWTH OF HIGH-QUALITY AL2O3 DIELECTRICS

被引：201

作者：

HIGASHI, GS

FLEMING, CG

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 19期

关键词：

D O I：

10.1063/1.102337

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1963 / 1965

页数：3

共 10 条

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