POSTDEPOSITION PROCESS FOR IMPROVING OPTICAL-PROPERTIES OF CHEMICAL-VAPOR-DEPOSITED SILICON

被引：3

作者：

GOELA, JS

TAYLOR, RL

机构：

[1] Morton International, Inc, CVD Incorporated, Woburn, Massachusetts

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1992年 / 75卷 / 08期

关键词：

D O I：

10.1111/j.1151-2916.1992.tb04475.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A high-temperature, postdeposition treatment was developed to significantly improve the near-infrared transmission of chemical-vapor-deposited polycrystalline Si (CVD-Si). This treatment did not significantly affect the hardness and flexural strength of CVD-Si, reduced the elastic modulus by 12%, and made the microstructure more uniform and isotropic by modifying the columnar growth structure that is typical of CVD materials.

引用

页码：2134 / 2138

页数：5