THERMAL-OXIDATION AND RESISTIVITY OF TANTALUM NITRIDE FILMS

被引:20
作者
BRADY, DP
FUSS, FN
GERSTENBERG, D
机构
关键词
D O I
10.1016/0040-6090(80)90383-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:287 / 302
页数:16
相关论文
共 13 条
[1]  
Berry R.W., 1968, THIN FILM TECHNOLOGY
[2]  
BRADY DW, UNPUBLISHED
[3]  
FISHER JS, 1968, 18TH P EL COMP C, P299
[4]   EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS [J].
GERSTENBERG, D ;
CALBICK, CJ .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) :402-&
[5]   PROPERTIES OF ANODIC FILMS FORMED ON REACTIVELY SPUTTERED TANTALUM [J].
GERSTENBERG, D .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (06) :542-+
[6]   ON MECHANISM OF FORMATION OF THIN OXIDE LAYERS ON NICKEL [J].
HAUFFE, K ;
PETHE, L ;
SCHMIDT, R ;
MORRISON, SR .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (05) :456-&
[7]  
KUO CY, 1965, 1965 P EL COMP C WAS, P123
[8]   OXIDATION OF METALS [J].
LAWLESS, KR .
REPORTS ON PROGRESS IN PHYSICS, 1974, 37 (02) :231-+
[9]   MATERIAL CHARACTERIZATION OF TI-CU-NI-AU (TCNA) - NEW LOW-COST THIN-FILM CONDUCTOR SYSTEM [J].
MORABITO, JM ;
THOMAS, JH ;
LESH, NG .
IEEE TRANSACTIONS ON PARTS HYBRIDS AND PACKAGING, 1975, 11 (04) :253-262
[10]   TANTALUM FILM CAPACITORS WITH IMPROVED AC PROPERTIES [J].
ROTTERSMAN, MH ;
BILL, MJ ;
GERSTENBERG, D .
IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY, 1978, 1 (02) :137-142