LASER SPECTROSCOPIC DETECTION OF RADICALS IN THE PHOTOLYSIS OF DISILANE WITH AN ARF LASER

被引：3

作者：

OKADA, T

NISHIMI, A

SHIBAMARU, N

MAEDA, M

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1992年 / 31卷 / 11期

关键词：

ARF LASER PHOTOLYSIS; DISILANE; RESONANTLY ENHANCED MULTIPHOTON IONIZATION; LASER-INDUCED FLUORESCENCE;

D O I：

10.1143/JJAP.31.3707

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Disilane (Si2H6) was photodissociated with an ArF excimer laser and the radicals produced were probed by resonantly enhanced multiphoton ionization spectroscopy (REMPI) and laser-induced fluorescence spectroscopy (LIF). Silicon and hydrogen atoms, and SiH and Si2 molecules were detected. It was found that temporal changes of the densities of Si and Si2 were controlled by diffusion in the present experiment. Absolute density calibration of the measured REMPI signals is also presented.

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页码：3707 / 3711

页数：5

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