STUDY OF THE XECL LASER PUMPED BY A HIGH-INTENSITY ELECTRON-BEAM

被引:50
作者
TISONE, GC
HOFFMAN, JM
机构
关键词
D O I
10.1109/JQE.1982.1071646
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1008 / 1020
页数:13
相关论文
共 26 条
[1]  
[Anonymous], COMMUNICATION
[2]   ABSORPTION PROCESSES IN THE XECL LASER [J].
CHAMPAGNE, LF ;
PALUMBO, LJ ;
FINN, TG .
APPLIED PHYSICS LETTERS, 1979, 34 (05) :315-318
[3]   EFFICIENT OPERATION OF ELECTRON-BEAM-PUMPED XECL LASER [J].
CHAMPAGNE, LF .
APPLIED PHYSICS LETTERS, 1978, 33 (06) :523-525
[4]   TRANSIENT ABSORPTION IN ELECTRON-BEAM-EXCITED RARE-GASES AT XEF LASER WAVELENGTHS [J].
CHANG, RSF ;
CHAMPAGNE, LF .
APPLIED PHYSICS LETTERS, 1980, 36 (11) :879-881
[5]   STATE-TO-STATE RELAXATION PROCESSES FOR XECI (B,C) [J].
DREILING, TD ;
SETSER, DW .
JOURNAL OF CHEMICAL PHYSICS, 1981, 75 (09) :4360-4378
[6]   ABSORPTION AND GAIN MEASUREMENTS IN THE KRF LASER MEDIUM AT HIGH PUMP RATE [J].
EDWARDS, CB ;
ONEILL, F ;
SHAW, MJ .
APPLIED PHYSICS LETTERS, 1981, 38 (11) :843-845
[7]   60-NS E-BEAM EXCITATION OF RARE-GAS HALIDE LASERS [J].
EDWARDS, CB ;
ONEILL, F ;
SHAW, MJ .
APPLIED PHYSICS LETTERS, 1980, 36 (08) :617-620
[9]   KINETICS OF THE XECL (B-]X) LASER [J].
FINN, TG ;
CHANG, RSF ;
PALUMBO, LJ ;
CHAMPAGNE, LF .
APPLIED PHYSICS LETTERS, 1980, 36 (10) :789-791
[10]  
Fisher Charles, COMMUNICATION