DEGRADATION OF POLY(METHYLMETHACRYLATE) BY DEEP ULTRAVIOLET, X-RAY, ELECTRON-BEAM, AND PROTON-BEAM IRRADIATIONS

被引：133

作者：

CHOI, JO

MOORE, JA

CORELLI, JC

SILVERMAN, JP

BAKHRU, H

机构：

[1] RENSSELAER POLYTECH INST,CTR INTEGRATED ELECTR,TROY,NY 12180

[2] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

[3] SUNY ALBANY,DEPT PHYS,ALBANY,NY 12222

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584071

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2286 / 2289

页数：4

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