SENSITIVITY AND CONTRAST OF SOME PROTON-BEAM RESISTS

被引:18
作者
BRAULT, RG
MILLER, LJ
机构
关键词
D O I
10.1002/pen.760201605
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
引用
收藏
页码:1064 / 1068
页数:5
相关论文
共 15 条
[1]  
HALL TM, 1979, 15TH P S EL ION PHOT
[2]   ELECTRON-SCATTERING AND LINE-PROFILES IN NEGATIVE ELECTRON RESISTS [J].
HEIDENREICH, RD ;
BALLANTYNE, JP ;
THOMPSON, LF .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1284-1288
[3]   SCATTERING EFFECTS IN ION BEAM EXPOSURE OF PHOTORESIST POLYMER FILMS [J].
KANAYA, K ;
SHIMIZU, K ;
ISHIKAWA, Y .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1968, 1 (12) :1657-&
[4]   ION-BEAM EXPOSURE OF RESIST MATERIALS [J].
KOMURO, M ;
ATODA, N ;
KAWAKATSU, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (03) :483-490
[5]   POLYMERIC ELECTRON BEAM RESISTS [J].
KU, HY ;
SCALA, LC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) :980-&
[6]  
KYSER DF, 1974, 5TH P INT C EL ION B, P205
[7]   EXPERIMENTAL-OBSERVATIONS OF NEARLY MONODISPERSE POLYSTYRENE AS NEGATIVE ELECTRON RESISTS [J].
LAI, JH ;
SHEPHERD, LT .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (04) :696-698
[8]   ENERGY DEPOSITION FUNCTIONS IN ELECTRON RESIST FILMS ON SUBSTRATES [J].
PARIKH, M ;
KYSER, DF .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) :1104-1111
[9]  
RENSCH DB, 1980, J VAC SCI TECHNOL, V17, P1897
[10]  
SAITOU N, 1973, JPN J APPL PHYS, V12, P94