400-A HIGH ASPECT-RATIO LINES PRODUCED IN POLYMETHYL METHACRYLATE (PMMA) BY ION-BEAM EXPOSURE

被引：42

作者：

KARAPIPERIS, L

LEE, CA

机构：

[1] CORNELL UNIV,SCH ELECT ENGN,ITHACA,NY 14853

[2] CORNELL UNIV,NATL RES & RESOURCE FACIL SUBMICRON STRUCT,ITHACA,NY 14853

来源：

APPLIED PHYSICS LETTERS | 1979年 / 35卷 / 05期

关键词：

D O I：

10.1063/1.91137

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report preliminary results on the fabrication of 400- and 2600-Å deep lines in polymethyl methacrylate (PMMA) by means of H+ exposure through a holographically produced fine conformal gold mask.

引用

页码：395 / 397

页数：3

共 13 条

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SMITH, HI
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