SELF-DEVELOPING HOLOGRAPHIC RECORDING IN LI-IMPLANTED TE THIN-FILMS

被引:26
作者
BEAUVAIS, J
LESSARD, RA
GALARNEAU, P
KNYSTAUTAS, EJ
机构
[1] UNIV LAVAL,LASER DEPT PHYS,QUEBEC CITY G1K 7P4,QUEBEC,CANADA
[2] INST NATL OPT,ST FOY G1V 4C5,QUEBEC,CANADA
关键词
D O I
10.1063/1.103434
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ablative holographic recording was performed on Li-implanted Te thin films using a Nd:YAG laser. Implantation doses ranging from 2.9×1013 to 2.3×1015 ions/cm2 within the thin films were seen to produce an increase of the writing threshold by 20% and a reduction of the diffraction efficiency of the recorded gratings at the highest doses. For doses as low as 1.2×1014 ions/cm2, a considerable increase in the stability of the recording media has been observed.
引用
收藏
页码:1354 / 1356
页数:3
相关论文
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