MICROCRYSTALLINE STRUCTURE IN GLOW-DISCHARGE-PRODUCED SILICON FILMS

被引:7
作者
NAGATA, Y [1 ]
KUNIOKA, A [1 ]
YAMAZAKI, S [1 ]
机构
[1] SEMICOND ENERGY LAB,SETAGAYA KU,TOKYO 157,JAPAN
关键词
D O I
10.1063/1.92279
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:142 / 143
页数:2
相关论文
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