ALIGNMENT ERRORS FROM RESIST COATING TOPOGRAPHY

被引：21

作者：

BOBROFF, N

ROSENBLUTH, A

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期

关键词：

D O I：

10.1116/1.583963

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：403 / 408

页数：6

共 16 条

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[4]

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[5]

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[6]

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[7] PLANE-WAVE EXPANSIONS USED TO DESCRIBE THE FIELD DIFFRACTED BY A GRATING [J].

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[8]

MAYSTRE D, 1984, PROGR OPTICS, V21, P3

[9]

MEYER H, 1984, P SOC PHOTOOPT INSTR, V470, P178

[10] FUNDAMENTAL LIMITS IN ESTIMATING LIGHT PATTERN POSITION [J].

NOWAKOWSKI, J ;

ELBAUM, M .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1983, 73 (12) :1744-1758

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