AN OPTICAL ALIGNMENT MICROSCOPE FOR X-RAY-LITHOGRAPHY

被引：9

作者：

BOBROFF, N

TIBBETTS, R

WILCZYNSKI, J

WILSON, A

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 01期

关键词：

D O I：

10.1116/1.583314

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：285 / 289

页数：5

共 8 条

[1] ACOSTA RE, 1984, P SOC PHOTO-OPT INST, V448, P114, DOI 10.1117/12.939214
[2] ACOSTA RE, 1984, P MICROCIRCUIT ENG
[3] FAY B, 1980, J VAC SCI TECHNOL, V16, P1954
[4] APPLICATION OF ZONE PLATES TO ALIGNMENT IN MICROLITHOGRAPHY
FELDMAN, M
WHITE, AD
WHITE, DL
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1224 - 1228
[5] KAWAGUCHI E, 1982, B JPN SOC PREC ENG, V16, P197
[6] A WIDE-RANGE ALIGNMENT SYSTEM FOR X-RAY-LITHOGRAPHY
NELSON, DA
DIMILIA, V
WARLAUMONT, JM
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1219 - 1223
[7] WHITE AD, 1977, APPL OPTICS, V16, P549, DOI 10.1364/AO.16.0549_1
[8] WILCZYNSKI JS, 1980, Patent No. 4232969