APPLICATION OF ZONE PLATES TO ALIGNMENT IN MICROLITHOGRAPHY

[1] ALIGNMENT OF X-RAY LITHOGRAPHY MASKS USING A NEW INTERFEROMETRIC-TECHNIQUE - EXPERIMENTAL RESULTS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 984 - 986

[2] FAY B, 1979, J VAC SCI TECHNOL, V16, P1954, DOI 10.1116/1.570364

[3] EFFICIENCES OF ZONE PLATES AND PHASE ZONE PLATES [J]. APPLIED OPTICS, 1967, 6 (11) : 2011 - +

[4] BORON-NITRIDE MASK STRUCTURE FOR X-RAY-LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1959 - 1961

[5] MYERS OE, 1951, AM J PHYS, V19, P359, DOI 10.1119/1.1932827

[6] STEGLIANI DJ, 1961, J OPT SOC AM, V57, P610

[7] WITTEKOEK S, 1980, SOLID STATE TECH JUN, P80

[8] ZONE PLATES AND THEIR ABERRATIONS [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1972, 62 (08) : 972 - &

[9] 1977, Patent No. 4037969

[1] ALIGNMENT OF X-RAY LITHOGRAPHY MASKS USING A NEW INTERFEROMETRIC-TECHNIQUE - EXPERIMENTAL RESULTS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 984 - 986

[2] FAY B, 1979, J VAC SCI TECHNOL, V16, P1954, DOI 10.1116/1.570364

[3] EFFICIENCES OF ZONE PLATES AND PHASE ZONE PLATES [J]. APPLIED OPTICS, 1967, 6 (11) : 2011 - +

[4] BORON-NITRIDE MASK STRUCTURE FOR X-RAY-LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1959 - 1961

[5] MYERS OE, 1951, AM J PHYS, V19, P359, DOI 10.1119/1.1932827

[6] STEGLIANI DJ, 1961, J OPT SOC AM, V57, P610

[7] WITTEKOEK S, 1980, SOLID STATE TECH JUN, P80

[8] ZONE PLATES AND THEIR ABERRATIONS [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1972, 62 (08) : 972 - &

[9] 1977, Patent No. 4037969