ALIGNMENT OF X-RAY LITHOGRAPHY MASKS USING A NEW INTERFEROMETRIC-TECHNIQUE - EXPERIMENTAL RESULTS

被引：21

作者：

AUSTIN, S

SMITH, HI

FLANDERS, DC

机构：

[1] MIT,ELECTR RES LAB,CAMBRIDGE,MA 02139

[2] MIT,LINCOLN LAB,LEXINGTON,MA 02173

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 03期

关键词：

D O I：

10.1116/1.569691

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：984 / 986

页数：3

共 8 条

[1] NEW INTERFEROMETRIC ALIGNMENT TECHNIQUE [J].

FLANDERS, DC ;

SMITH, HI ;

AUSTIN, S .

APPLIED PHYSICS LETTERS, 1977, 31 (07) :426-428

[2]

FLANDERS DC, 1978, J VAC SCI TECHNOL, V15, P994

[3] PHOTOLITHOGRAPHIC MASK ALIGNMENT USING MOIRE TECHNIQUES [J].

KING, MC ;

BERRY, DH .

APPLIED OPTICS, 1972, 11 (11) :2455-&

[4]

MCCOY JH, 1976, SOLID STATE TECHNOL, V19, P59

[5] ALIGNMENT OF FLAT STRUCTURES VIA MOIRE INTERFERENCE FRINGES [J].

SCHWIDER, J ;

HILLER, C .

OPTICA ACTA, 1976, 23 (01) :49-61

[6] FABRICATION TECHNIQUES FOR SURFACE-ACOUSTIC-WAVE AND THIN-FILM OPTICAL DEVICES [J].

SMITH, HI .

PROCEEDINGS OF THE IEEE, 1974, 62 (10) :1361-1387

[7] X-RAY LITHOGRAPHY - COMPLEMENTARY TECHNIQUE TO ELECTRON-BEAM LITHOGRAPHY [J].

SMITH, HI ;

SPEARS, DL ;

BERNACKI, SE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06) :913-917

[8]

SPEARS DL, 1972, SOLID STATE TECHNOL, V15, P21

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