PHOTOLITHOGRAPHIC MASK ALIGNMENT USING MOIRE TECHNIQUES

[1] Guild J., 1956, INTERFERENCE SYSTEMS

[2] OVERVIEW OF NEW MASK-MAKING SYSTEM [J]. BELL SYSTEM TECHNICAL JOURNAL, 1970, 49 (09): : 1997 - +

[3] THEORETICAL INTERPRETATION OF MOIRE PATTERNS [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1964, 54 (02) : 169 - &

[4] The ocular interferometer and the objective interferometer in the liquidation of double stars [J]. ZEITSCHRIFT FUR PHYSIK, 1926, 37 (10/11): : 732 - 757

[5] DEVELOPMENT OF ALIGNMENT TECHNIQUES FOR FABRICATION OF MICROELECTRIC DEVICES [J]. HUMAN FACTORS, 1969, 11 (02) : 189 - &

[6] STECHER M, 1964, J PHYS, V32, P247

[7] Theocaris P.S., 1969, MOIRE FRINGES STRAIN

[1] Guild J., 1956, INTERFERENCE SYSTEMS

[2] OVERVIEW OF NEW MASK-MAKING SYSTEM [J]. BELL SYSTEM TECHNICAL JOURNAL, 1970, 49 (09): : 1997 - +

[3] THEORETICAL INTERPRETATION OF MOIRE PATTERNS [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1964, 54 (02) : 169 - &

[4] The ocular interferometer and the objective interferometer in the liquidation of double stars [J]. ZEITSCHRIFT FUR PHYSIK, 1926, 37 (10/11): : 732 - 757

[5] DEVELOPMENT OF ALIGNMENT TECHNIQUES FOR FABRICATION OF MICROELECTRIC DEVICES [J]. HUMAN FACTORS, 1969, 11 (02) : 189 - &

[6] STECHER M, 1964, J PHYS, V32, P247

[7] Theocaris P.S., 1969, MOIRE FRINGES STRAIN