VACUUM SYSTEMS FOR SPUTTERING

被引：9

作者：

SHIRN, GA

PATTERSON, WL

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1970年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.1492898

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：453 / +

页数：1

共 8 条

[1] BAKER NA, 1968, J SCI INSTRUM, V1, P774
[2] Crawley D.J., 1954, VACUUM, V4, P415, DOI DOI 10.1016/0042-207X(54)90003-2
[3] BACKSTREAMING MEASUREMENTS ABOVE LIQUID-NITROGEN TRAPS
HABLANIAN, MH
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01): : 265 - +
[4] HABLANIAN MH, 1962, 1961 VAC S T
[5] THEORETICAL INVESTIGATION OF OIL BACKSTREAMING THROUGH VACUUM TRAP
JONES, DW
TSONIS, CA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1964, 1 (01): : 19 - &
[6] MASS SPECTROMETRY OF BACKGROUND GASES IN GLOW-DISCHARGE SPUTTERING OF TANTALUM THIN FILMS
SOSNIAK, J
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1967, 4 (02): : 87 - &
[7] SPUTTERED SILICON-CHROMIUM RESISTIVE FILMS
WAITS, RK
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (02): : 308 - &
[8] INSTALLATION OPERA 7