AN ATOMISTIC MODEL FOR STEPPED DIAMOND GROWTH

被引:45
作者
FRENKLACH, M [1 ]
SKOKOV, S [1 ]
WEINER, B [1 ]
机构
[1] PENN STATE UNIV,DEPT PHYS,DU BOIS,PA 15801
关键词
D O I
10.1038/372535a0
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
The growth of many crystalline materials occurs through lateral propagation of steps over the surface(1-3). A stepped texture is also characteristic of diamond grown by chemical vapour deposition (CVDM)(4-10). Diffusion of atoms on the surface is usually held responsible for the stepped growth of metals, but it has been thought(11-14) that the stronger bonding of adatoms should prevent this mechanism from operating in the case of diamond. Recent experiments(15) have, however, indicated that surface diffusion can take place during diamond growth. We have recently shown theoretically(16) that bridging methylene (CH2) groups on the {100} plane of diamond growing in the presence of hydrogen can migrate in a manner equivalent to surface diffusion. Here we show that this theoretical picture can be developed into an atomistic model that accounts for stepped growth of diamond. The stepped pattern can be understood in terms of the formation of surface-bound species from the gaseous precursors, followed by their migration by means of a series of surface chemical reactions involving covalent bond breaking and formation.
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页码:535 / 537
页数:3
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