75TH ANNIVERSARY REVIEW SERIES - EVOLUTION OF SILICON SEMICONDUCTOR TECHNOLOGY - 1952-1977

被引:17
作者
DEAL, BE
EARLY, JM
机构
[1] Fairchild Camera, Instrument Corporation, Research and Development Laboratory, Palo Alto
关键词
D O I
10.1149/1.2128981
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
[No abstract available]
引用
收藏
页码:C20 / C32
页数:13
相关论文
共 229 条
[71]   ISOPLANAR INTEGRATED INJECTION LOGIC - HIGH-PERFORMANCE BIPOLAR TECHNOLOGY [J].
HENNIG, F ;
HINGARH, HK ;
OBRIEN, D ;
VERHOFSTADT, PWJ .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1977, 12 (02) :101-109
[72]  
Hoerni JA, 1962, U.S. Patent, Patent No. [3025589, 3,025,589]
[73]  
HOERNI JA, 1960, OCT IEEE EL DEV M WA
[74]  
HOGAN CL, 1977, INTERFACE AGE, V2, P24
[75]  
HOLLAHAN R, 1974, TECHNIQUES APPLICATI
[76]   SURFACE AND THIN-FILM ANALYSIS OF SEMICONDUCTOR-MATERIALS [J].
HONIG, RE .
THIN SOLID FILMS, 1976, 31 (1-2) :89-122
[77]  
HUERLE FM, 1978, THIN FILMS INTERDIFF
[78]  
HUFF HR, SEMICONDUCTOR SILICO
[79]  
HUGHES HG, 1976, ETCHING
[80]   RESISTIVITY OF BULK SILICON AND OF DIFFUSED LAYERS IN SILICON [J].
IRVIN, JC .
BELL SYSTEM TECHNICAL JOURNAL, 1962, 41 (02) :387-+