CONTROL OF OPTICAL GAP IN A-SIXC1-X-H ALLOY-FILMS PRODUCED BY REACTIVE SPUTTERING METHOD

被引：8

作者：

KATAYAMA, Y

SHIMADA, T

USAMI, K

ISHIOKA, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷

关键词：

D O I：

10.7567/JJAPS.19S2.115

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：115 / 118

页数：4

共 12 条

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[9] COMPOSITIONAL AND STRUCTURAL-PROPERTIES OF AMORPHOUS SIXC1-X-H ALLOYS PREPARED BY REACTIVE SPUTTERING [J].

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