MEASUREMENT OF THE SIH3 RADICAL DENSITY IN SILANE PLASMA USING INFRARED DIODE-LASER ABSORPTION-SPECTROSCOPY

被引：69

作者：

ITABASHI, N

KATO, K

NISHIWAKI, N

GOTO, T

YAMADA, C

HIROTA, E

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1988年 / 27卷 / 08期

关键词：

D O I：

10.1143/JJAP.27.L1565

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L1565 / L1567

页数：3

共 9 条

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[3]

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[6]

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[7] MASS-SPECTROMETRY OF A SILANE GLOW-DISCHARGE DURING PLASMA DEPOSITION OF A-SI-H FILMS [J].

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[8] Long optical paths of large aperture [J].

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[9] DETECTION OF THE SILYL RADICAL SIH3 BY INFRARED DIODE-LASER SPECTROSCOPY [J].

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HIROTA, E .

PHYSICAL REVIEW LETTERS, 1986, 56 (09) :923-925

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