RESISTIVITY AND DENSITY OF GE FILMS OBLIQUELY DEPOSITED IN VACUUM

被引：12

作者：

TAKAHASHI, M

ONISHI, H

TADA, O

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1971年 / 42卷 / 02期

关键词：

D O I：

10.1063/1.1660101

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：833 / +

页数：1

共 14 条

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[9]

MAYER H, 1959, P INT C STRUCTURE PR, P225

[10]

NAKAI J, 1963, OYO BUTURI, V32, P91

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