PLASMA DEPOSITION OF (TI,AL)N COATINGS AT VARIOUS MAGNETRON DISCHARGE POWER LEVELS

Properties of (Ti,Al)N coatings, deposited at various magnetron discharge power levels in a double magnetron ion plating system, were investigated. The increase in magnetron discharge power corresponds to an increase in the metal to nitrogen ratio, an increase in the substrate temperature and an increase in the flux of substrate bombarding particles. Microhardness and critical load measurements, scanning electron microscopy (SEM), X-ray and energy dispersive X-ray (EDX) analyses and deposition rate measurements are presented. GK375