STRESS-SENSITIVE PROPERTIES OF SILICON-GATE MOS DEVICES

被引:62
作者
MIKOSHIBA, H
机构
关键词
D O I
10.1016/0038-1101(81)90085-X
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:221 / 232
页数:12
相关论文
共 13 条
[1]   MOBILITY ANISOTROPY AND PIEZORESISTANCE IN SILICON P-TYPE INVERSION LAYERS [J].
COLMAN, D ;
BATE, RT ;
MIZE, JP .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (04) :1923-&
[3]   EFFECT OF STRAIN ON MOS TRANSISTORS [J].
DOREY, AP ;
MADDERN, TS .
SOLID-STATE ELECTRONICS, 1969, 12 (03) :185-&
[4]   LOW-TEMPERATURE STRAIN SENSITIVITY OF MOS-TRANSISTORS [J].
GAYDON, BG .
SOLID-STATE ELECTRONICS, 1973, 16 (02) :147-154
[5]  
GOETZBER.A, 1966, AT&T TECH J, V45, P1097
[6]   RESISTIVITY OF BULK SILICON AND OF DIFFUSED LAYERS IN SILICON [J].
IRVIN, JC .
BELL SYSTEM TECHNICAL JOURNAL, 1962, 41 (02) :387-+
[7]   HALL MOBILITY IN CHEMICALLY DEPOSITED POLYCRYSTALLINE SILICON [J].
KAMINS, TI .
JOURNAL OF APPLIED PHYSICS, 1971, 42 (11) :4357-&
[8]   STRUCTURE OF CHEMICALLY DEPOSITED POLYCRYSTALLINE-SILICON FILMS [J].
KAMINS, TI ;
CASS, TR .
THIN SOLID FILMS, 1973, 16 (02) :147-165
[9]   PRESSURE DEPENDENCE OF THE RESISTIVITY OF SILICON [J].
PAUL, W ;
PEARSON, GL .
PHYSICAL REVIEW, 1955, 98 (06) :1755-1757
[10]  
RAICHOUDHURY P, 1973, J ELECTROCHEM SOC, V120, P1761, DOI 10.1149/1.2403359