HALL-MOBILITY OF TE-DOPED IN1-XGAXP AT 300 K

被引:12
作者
KATO, T [1 ]
SHIMIZU, A [1 ]
ISHIDA, T [1 ]
机构
[1] YAMANASHI UNIV,FAC ENGN,DEPT ELECTR ENGN,KOFU 400,JAPAN
关键词
D O I
10.1143/JJAP.13.1481
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:1481 / 1482
页数:2
相关论文
共 5 条
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