FRICTIONAL-PROPERTIES OF CHEMICAL VAPOR-DEPOSITED DIAMOND THIN-FILMS

被引：10

作者：

KOHZAKI, M

HIGUCHI, K

NODA, S

机构：

[1] Toyota Central Research and Development Laboratories, Inc., Aichi-gun, Aichi-ken, 480-11, Nagakute-cho

来源：

MATERIALS LETTERS | 1990年 / 9卷 / 2-3期

关键词：

D O I：

10.1016/0167-577X(90)90156-G

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Diamond thin films deposited on sintered SiC by the hot filament CVD method were subjected to ball-on-disk friction and wear test with a SiC ball in an ambient atmosphere. The friction coefficient of the diamond film with smooth surface was about 0.09 and effectively no wear was detected. © 1990.

引用

页码：80 / 82

页数：3

共 5 条

[1] THE FRICTIONAL ANISOTROPY OF DIAMOND
ENOMOTO, Y
TABOR, D
[J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1981, 373 (1755) : 405 - 417
[2] TRIBOLOGICAL CHARACTERISTICS OF SYNTHESIZED DIAMOND FILMS ON SILICON-CARBIDE
JAHANMIR, S
DECKMAN, DE
IVES, LK
FELDMAN, A
FARABAUGH, E
[J]. WEAR, 1989, 133 (01) : 73 - 81
[3] GROWTH OF DIAMOND PARTICLES FROM METHANE-HYDROGEN GAS
MATSUMOTO, S
SATO, Y
TSUTSUMI, M
SETAKA, N
[J]. JOURNAL OF MATERIALS SCIENCE, 1982, 17 (11) : 3106 - 3112
[4] THE FRICTION OF DIAMOND SLIDING ON DIAMOND
SAMUELS, B
WILKS, J
[J]. JOURNAL OF MATERIALS SCIENCE, 1988, 23 (08) : 2846 - 2864
[5] GROWTH OF DIAMOND THIN-FILMS BY ELECTRON-ASSISTED CHEMICAL VAPOR-DEPOSITION AND THEIR CHARACTERIZATION
SAWABE, A
INUZUKA, T
[J]. THIN SOLID FILMS, 1986, 137 (01) : 89 - 99

← 1 →