THE CORROSION BEHAVIOR OF SPUTTER-DEPOSITED AL-ZR ALLOYS IN 1-M HCL SOLUTION

被引:34
作者
YOSHIOKA, H [1 ]
HABAZAKI, H [1 ]
KAWASHIMA, A [1 ]
ASAMI, K [1 ]
HASHIMOTO, K [1 ]
机构
[1] TOHOKU UNIV,INST MAT RES,SENDAI,MIYAGI 980,JAPAN
关键词
D O I
10.1016/0010-938X(92)90071-A
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Using electrochemical measurements and XPS analysis, the corrosion behavior of sputter-deposited Al-Zr alloys in 1 M HCl solution at 30-degrees-C was investigated. Their open circuit corrosion resistance, pitting corrosion resistance and passivating ability were enhanced with increasing zirconium. Alloying of aluminum with zirconium extends the time to reach the steady passive state by potentiostatic polarization and decreases the steady state current density. XPS analysis revealed that when potentiostatic polarization was continued in the passive region, Zr4+ cations in the surface film was slightly concentrated simultaneously with the concentration of zirconium in the underlying alloy surface, due to preferential dissolution of aluminum. The cationic fraction of the surface film finally consisted of Al3+ and Zr4+ according to the bulk alloy composition, although the Zr4+ content was apt to be higher than the alloy zirconium content. Therefore, the higher the alloy zirconium content, the higher the corrosion resistance of the sputter-deposited Al-Zr alloys.
引用
收藏
页码:425 / 436
页数:12
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