MAGNETIC RECORDING CHARACTERISTICS OF SPUTTERED GAMMA-FE2O3 THIN-FILM DISKS

被引:65
作者
HATTORI, S [1 ]
ISHII, Y [1 ]
SHINOHARA, M [1 ]
NAKAGAWA, T [1 ]
机构
[1] FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
关键词
D O I
10.1109/TMAG.1979.1060465
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A thin film disk of γ-Fe2O3 for high density magnetic recording has been developed. γ-Fe2O3 films were prepared in a serial process from the reactive sputtering of on to α-Fe2O3 reduced to Fe3O4 and oxidized to γ-Fe2O3. A high coercive force of 700 Oe and a squareness ratio of 0.8 were attained for γ-(Fe0.955Ti0.025Co0.02)2O3. Recording characteristics of the disk were evaluated using a Mn-Zn ferrite head. The recording density D50 reached 1,100 bits/mm (27,900 bpi), and the number of dropout errors at 50% threshold level was less than 50 per surface. Stability versus temperature change and wear resistance were also evaluated. © 1979 IEEE
引用
收藏
页码:1549 / 1551
页数:3
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