DEPOSITION OF MAGNETITE FILMS BY REACTIVE SPUTTERING OF IRON

被引：19

作者：

HELLER, J ^{[1
]}

机构：

[1] IBM DEUTSCHLAND GMBH, GERMAN MFG TECHNOL CTR, SINDELFINGEN, FED REP GER

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1976年 / 12卷 / 04期

关键词：

D O I：

10.1109/TMAG.1976.1059043

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：396 / 400

页数：5

相关论文

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