ADSORPTION-SITE INVESTIGATION OF RB/CU(111) USING THE X-RAY STANDING-WAVE METHOD

被引：23

作者：

SHI, X

SU, C

HESKETT, D

BERMAN, L

KAO, CC

BEDZYK, MJ

机构：

[1] UNIV RHODE ISL,DEPT PHYS,KINGSTON,RI 02881

[2] BROOKHAVEN NATL LAB,NATL SYNCHROTRON LIGHT SOURCE,UPTON,NY 11973

[3] NORTHWESTERN UNIV,DEPT MAT SCI & ENGN,EVANSTON,IL 60208

[4] ARGONNE NATL LAB,DIV MAT SCI,ARGONNE,IL 60439

来源：

PHYSICAL REVIEW B | 1994年 / 49卷 / 20期

关键词：

D O I：

10.1103/PhysRevB.49.14638

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have carried out a back reflection x-ray standing-wave investigation to study the adsorbate-substrate bond length and bonding site for the system Rb/Cu(111). Our low-energy electron diffraction study showed an ordered (2 X 2) phase for one monolayer of Rb on Cu(111) (theta = 0.25). By measuring both the (111) and (111BAR) Bragg reflections at this coverage, we determine the Rb adsorption to be in the top site. We observe a high degree of order in the Rb overlayer perpendicular to the surface, with large disorder parallel to the surface.

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页码：14638 / 14642

页数：5

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