INFLUENCE OF A GASEOUS BOUNDARY-LAYER ON THE OXIDATION OF REACTION-BONDED SILICON-NITRIDE AT 1400-DEGREES-C

被引:6
作者
BARLIER, P
TORRE, JP
机构
关键词
D O I
10.1007/BF01028351
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:235 / 237
页数:3
相关论文
共 10 条
[1]  
DAVIDGE RW, 1972, SPECIAL CERAMICS, V5, P329
[2]  
HINZE JW, 1976, J ELECTROCHEM SOC, V123, P1073
[3]  
Kubaschewski O., 1967, METALLURGICAL THERMO
[4]  
SCHLICHTING J, 1977, POWDER METALL INT, V9, P36
[5]  
SINGHAL SC, 1977, NITROGEN CERAMICS, P607
[6]   SOME EFFECTS OF AL AND O-2 ON NITRIDATION OF SILICON COMPACTS [J].
TORRE, JP ;
MOCELLIN, A .
JOURNAL OF MATERIALS SCIENCE, 1976, 11 (09) :1725-1733
[7]  
TORRE JP, 1977, NITROGEN CERAMICS, P63
[8]   PASSIVITY DURING THE OXIDATION OF SILICON AT ELEVATED TEMPERATURES [J].
WAGNER, C .
JOURNAL OF APPLIED PHYSICS, 1958, 29 (09) :1295-1297
[9]  
WALZER P, 1977, Z WERKSTOFFTECHN, V8, P294
[10]  
WASHBURN ME, 1973, 2ND P ARM MAT TECHN