COMPARATIVE-STUDY OF LASER AND THERMAL ANNEALING OF BORON-IMPLANTED SILICON

被引：60

作者：

NARAYAN, J

YOUNG, RT

WHITE, CW

机构：

来源：

关键词：

D O I：

10.1063/1.325398

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3912 / 3917

页数：6

共 21 条

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MAYER, JW .

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[7]

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[8]

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[9]

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[10]

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