SPUTTERING OF LITHIUM COMPOUNDS FOR PREPARATION OF ELECTROLYTE THIN-FILMS

被引：67

作者：

DUDNEY, NJ ^{[1
]}

BATES, JB ^{[1
]}

ZUHR, RA ^{[1
]}

LUCK, CF ^{[1
]}

ROBERTSON, JD ^{[1
]}

机构：

[1] UNIV KENTUCKY, DEPT CHEM, LEXINGTON, KY 40506 USA

来源：

SOLID STATE IONICS | 1992年 / 53卷

关键词：

D O I：

10.1016/0167-2738(92)90443-S

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Several lithium compounds have been sputtered in a planar rf magnetron source. Lithium orthophosphate was observed to sputter normally and nearly stoichiometric films were obtained. Sputtering of lithium orthosilicate, however, resulted in extremely lithium deficient films. This was due to the decomposition of the target and the segregation of large amounts of Li2O to the unsputtered areas of the surface of the target.

引用

页码：655 / 661

页数：7

共 6 条

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LUCK, CF
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[5] VOSSEN JL, 1978, THIN FILM PROCESSES, P11
[6] PLASMA DIAGNOSTIC STUDIES OF THE INFLUENCE OF PROCESS VARIABLES UPON THE ATOMIC AND MOLECULAR-SPECIES EJECTED FROM (1-X)LI4SIO4-XLI3PO4 TARGETS DURING RADIO-FREQUENCY MAGNETRON SPUTTERING
WACHS, AL
BATES, JB
DUDNEY, NJ
LUCK, CF
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03): : 492 - 495

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