VARIABLE AXIS LENS FOR ELECTRON-BEAMS

[1] MOORE RN, UNPUBLISHED

[2] OHIWA H, 1971, ELECTRON COMMUN JPN, V54, P44

[3] NEW IMAGING AND DEFLECTION CONCEPT FOR PROBE-FORMING MICROFABRICATION SYSTEMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1170 - 1173

[4] RECENT ADVANCES IN ELECTRON-BEAM LITHOGRAPHY FOR THE HIGH-VOLUME PRODUCTION OF VLSI DEVICES [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 663 - 674

[5] WEBER EV, 1977, ELECTRONICS, V50, P96

[1] MOORE RN, UNPUBLISHED

[2] OHIWA H, 1971, ELECTRON COMMUN JPN, V54, P44

[3] NEW IMAGING AND DEFLECTION CONCEPT FOR PROBE-FORMING MICROFABRICATION SYSTEMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1170 - 1173

[4] RECENT ADVANCES IN ELECTRON-BEAM LITHOGRAPHY FOR THE HIGH-VOLUME PRODUCTION OF VLSI DEVICES [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 663 - 674

[5] WEBER EV, 1977, ELECTRONICS, V50, P96