INITIAL-STAGE OF LASER-INDUCED SELECTIVE CHEMICAL VAPOR-DEPOSITION OF SILICON

被引：8

作者：

TANAKA, T

DEGUCHI, K

HIROSE, M

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1987年 / 26卷 / 12期

关键词：

D O I：

10.1143/JJAP.26.2057

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2057 / 2060

页数：4

共 9 条

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[2]

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[4]

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[5]

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[8] THE 147-NM PHOTOLYSIS OF DISILANE [J].

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[9] TECHNIQUE FOR MEASURING SURFACE-DIFFUSION BY LASER-BEAM-LOCALIZED SURFACE PHOTOCHEMISTRY [J].

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