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DIELECTRIC RELAXATION OF WATER MOLECULES IN OXIDE FILMS ON SILICON
被引:4
作者
:
DORDA, G
论文数:
0
引用数:
0
h-index:
0
DORDA, G
KADERKA, M
论文数:
0
引用数:
0
h-index:
0
KADERKA, M
机构
:
来源
:
SOLID STATE COMMUNICATIONS
|
1967年
/ 5卷
/ 10期
关键词
:
D O I
:
10.1016/0038-1098(67)90709-0
中图分类号
:
O469 [凝聚态物理学];
学科分类号
:
070205 ;
摘要
:
引用
收藏
页码:791 / +
页数:1
相关论文
共 7 条
[1]
DIELECTRIC RELAXATION IN THERMALLY GROWN SIO2 FILMS
BURKHARDT, PJ
论文数:
0
引用数:
0
h-index:
0
BURKHARDT, PJ
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(02)
: 268
-
+
[2]
AN ELLIPSOMETER INVESTIGATION OF VAPOR ADSORPTION ON ETCHED SILICON
CLAUSSEN, BH
论文数:
0
引用数:
0
h-index:
0
CLAUSSEN, BH
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1964,
111
(06)
: 646
-
652
[3]
DORDA G, 1967, VERHANDL DPG, V2, P41
[4]
HIROSE H, 1964, JPN J APPL PHYS, V3, P179
[5]
AN INVESTIGATION OF INSTABILITY AND CHARGE MOTION IN METAL-SILICON OXIDE-SILICON STRUCTURES
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(02)
: 222
-
+
[6]
PETERS FG, 1966, AM CERAM SOC BULL, V45, P1017
[7]
SKANAVI GI, 1949, PHYSICS DIELECTRICS, P475
←
1
→
共 7 条
[1]
DIELECTRIC RELAXATION IN THERMALLY GROWN SIO2 FILMS
BURKHARDT, PJ
论文数:
0
引用数:
0
h-index:
0
BURKHARDT, PJ
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(02)
: 268
-
+
[2]
AN ELLIPSOMETER INVESTIGATION OF VAPOR ADSORPTION ON ETCHED SILICON
CLAUSSEN, BH
论文数:
0
引用数:
0
h-index:
0
CLAUSSEN, BH
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1964,
111
(06)
: 646
-
652
[3]
DORDA G, 1967, VERHANDL DPG, V2, P41
[4]
HIROSE H, 1964, JPN J APPL PHYS, V3, P179
[5]
AN INVESTIGATION OF INSTABILITY AND CHARGE MOTION IN METAL-SILICON OXIDE-SILICON STRUCTURES
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(02)
: 222
-
+
[6]
PETERS FG, 1966, AM CERAM SOC BULL, V45, P1017
[7]
SKANAVI GI, 1949, PHYSICS DIELECTRICS, P475
←
1
→