STUDY OF LOCALIZED LEVELS IN SEMI-INSULATORS BY COMBINED MEASUREMENTS OF THERMALLY ACTIVATED OHMIC AND SPACE-CHARGE-LIMITED CONDUCTION

被引:123
作者
ROBERTS, GG
SCHMIDLIN, FW
机构
[1] Xerox Research Laboratories, Webster
[2] School of Physical Sciences, New University of Ulster, Coleraine, County Londonderry
来源
PHYSICAL REVIEW | 1969年 / 180卷 / 03期
关键词
D O I
10.1103/PhysRev.180.785
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
It is shown that measurement of thermal activation energies for both Ohmic and space-charge-limited conduction over a broad temperature range enables the deduction of both depth and concentration of localized levels in a semi-insulator, while measurement of the activation energy for Ohmic conduction alone is rarely definitive for a wide band-gap material. The basis for interpreting thermal activation energies for electrical conduction is discussed in detail. The analysis is applied to recent results on HgS, GaP, CdS, and ZnS: Cd. © 1969 The American Physical Society.
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页码:785 / +
页数:1
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